高密度集成电路散热用高导热金刚石/铜复合材料研究进展

Research progress of high thermal conductivity diamond/copper composites for heat dissipation of high density integrated circuits

  • 摘要: 集成电路规模不断增大,体积越来越小,散热问题已成为高密度集成电路进一步发展的关键问题。金刚石/铜复合材料具有优异的高导热性和低膨胀特性,有望在未来解决高热流密度情况下的散热问题。然而,金刚石与铜的界面亲和性差,存在较高的界面热阻,改善金刚石/铜界面亲和性、提高其热导率通常从烧结方法和金刚石与铜的界面调控两方面入手。本文聚焦于新一代高密度集成电路散热用高导热金刚石/铜复合材料,综述了其主要制备工艺和高导热优化工艺等方面的研究进展。进一步分析了其导热性能提升的瓶颈问题。最后,展望了其发展方向与应用优势。将为金刚石/铜复合材料及其相关高导热材料的制备与应用提供指引与参考。

     

    Abstract: The scale of integrated circuits is constantly increasing and their size is getting smaller, and heat dissipation has become a key issue for the further development of high-density integrated circuits. Diamond/copper composite material has the characteristics of high thermal conductivity and thermal stability, which is expected to solve the heat dissipation problem of devices under high heat flux density, and has aroused widespread research interest. This paper focuses on the new generation of high thermal conductivity diamond/copper composites for high density integrated circuit heat dissipation, and reviews the research progress of its main preparation methods and high thermal conductivity optimization processes. The bottleneck problem of improving its thermal conductivity is further analyzed. Finally, its development direction and application advantages are prospected, which will provide guidance and reference for the preparation and application of diamond/copper composites and related high thermal conductivity materials.

     

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